A fully fluorinated elastomer combining fluororubber elasticity with PTFE-like chemical inertness — for semiconductor, petrochemical and aerospace sealing where extreme chemical compatibility is required.
C–F bond energy 485 kJ/mol with no weak C–H bonds. Inert to 1800+ chemicals — resistant to strong acids, bases, organic solvents and plasma.
Tg as low as -20 °C with retained elasticity; no significant thermal degradation at 320 °C short-term.
Vacuum weight loss <0.1% — suited to wafer fabrication and thin-film deposition where cleanliness is critical.
Standard O-rings, custom profiles and bonded assemblies. Small-batch customisation with 2–4 week lead time.
Typical values below. Contact our engineers for the complete TDS.
| Parameter | Typical value | Test method |
|---|---|---|
| Polymer type | Fully fluorinated polyether backbone | FTIR |
| Fluorine content | ≥72% | Elemental analysis |
| Density | 1.90-2.02 g/cm³ | GB/T 533 |
| Hardness (ShA) | 65 / 75 / 80 / 90 | GB/T 531.1 |
| Tensile strength | ≥12 MPa | GB/T 528 |
| Elongation at break | ≥120% | GB/T 528 |
| Compression set (200 °C / 70 h) | <15% | GB/T 7759 |
| Operating temperature | -20 ~ 320°C | — |
| Plasma resistance | Excellent (O₂ / CF₄ / NF₃) | In-house test |
| Vacuum weight loss | <0.1% | ASTM E595 |
| Volume resistivity | >10¹⁴ Ω·cm | GB/T 1692 |
| TR10 (low-temperature retraction) | -5 ~ -15°C | GB/T 7758 |
Wafer processing, chamber sealing
Chemical pumps and valves, reactor sealing
Subsea trees, ultra-high-pressure valves
Wafer transfer and etch chamber O-ring seals — plasma resistant with low particle release
Pump and valve seals for strong acids and bases, reactor manway gaskets, sampling system seals
High-temperature hydraulic seals, fluorinated fuel-system O-rings, spacecraft propellant valves
GC/HPLC inlet septa, mass spectrometer vacuum seals, supercritical extraction seals
Tell us your media, temperature and pressure — our engineers will recommend the right grade.
Material selection →Chemical compatibility · Material database · TDS