For wafer fabrication, packaging & testing, flat-panel display, photolithography and other ultra-precision manufacturing scenarios, Yiran® provides ULPA ultra-high-efficiency filtration, AMC airborne molecular contamination control and FFU integrated solutions, meeting ISO 3-5 ultra-clean environment requirements in strict compliance with ITRS International Technology Roadmap for Semiconductors extreme air cleanliness standards.
Semiconductor manufacturing has reached 3nm nodes and below. A single 0.1μm particle can cause wafer defects. Additionally, AMC at ppb-level concentrations of NH₃, SO₂ and VOCs can cause fatal defects such as photoresist T-topping and wafer hazing.
Semiconductor processes have reached molecular-level sensitivity to airborne molecular contaminants. NH₃, SO₂, H₂S and VOCs can chemically react with photoresist on wafer surfaces, causing T-topping, hazing and gate oxide degradation. ITRS standards require NH₃ ≤0.2ppbv, SO₂ ≤0.05ppbv, total VOCs ≤0.26ppbv, demanding exceptional breakthrough capacity and selectivity from chemical filters.
Core process areas such as photolithography and etching require ISO 3-4 (Class 1-10), meaning per cubic foot of air, ≥0.1μm particles must not exceed 35 and 352 respectively. This demands thousands of FFUs operating 24/7/365 in tens of thousands of cubic meters of cleanroom space. Any performance degradation or leakage from a single ULPA filter can result in yield loss across the entire production line.
Scanner alignment accuracy reaches sub-nanometer levels. Even faint vibrations from FFU fans can impact exposure precision. Additionally, ESD during semiconductor manufacturing can instantly break down nanometer-scale gate oxides. ESD-safe filter and FFU designs, along with low-vibration design, have become mandatory requirements for advanced nodes.
Semiconductor cleanroom FFUs typically number in the thousands, accounting for 40-55% of cleanroom energy use. EC motor retrofit replacing AC motors, ULPA filter low-resistance design to reduce total pressure drop, and extended chemical filter replacement cycles are the three major cost-reduction directions that semiconductor fabs continuously pursue.
Yiran® semiconductor cleanroom solution integrates particle filtration (pre-medium-HEPA-ULPA) with molecular filtration (makeup air/recirculation AMC control), delivering uniform terminal supply via FFUs.
| Product Series | Model Example | Efficiency Rating | Standard Size (mm) | Rated Airflow (m³/h) | Initial ΔP (Pa) | Applicable Class | Media/Motor |
|---|---|---|---|---|---|---|---|
| RLR Roll Pre-Filter | RLR-2000-G3 | G3 / ISO Coarse 75% | 2000(W)×Roll 20m | — | 40 | — | Synthetic Roll Media |
| EFL Bag Medium | EFL-592-F7 | F7 / ISO ePM1 60% | 592×592×381 | 2850 | 110 | — | Synthetic Fiber |
| CGD AMC Chemical | CGD-592-H2S | H₂S Capacity ≥12wt% | 592×592×96 | 2000 | 80 | — | Impregnated Media |
| HSB Mixed-Bed Chem | HSB-592-Hybrid | Acid+Base Dual ≥90% | 592×592×96 | 1800 | 95 | — | Acid+Base Mixed |
| VCP Compact Sub-HEPA | VCP-592-F9 | F9 / ISO ePM1 85% | 592×592×292-4V | 3400 | 85 | — | Ultra-Fine Glass Fiber |
| ULP U15 ULPA | ULP-1220-U15 | U15 ≥99.9995% | 1220×610×78 | 1800 | 135 | ISO 4-5 | Glass Fiber/PTFE |
| ULP U16 ULPA | ULP-1220-U16 | U16 ≥99.99995% | 1220×610×78 | 1500 | 155 | ISO 3-4 | PTFE Ultra Membrane |
| FF FFU Unit | FF-U16-2×4-EC | U16 ULPA + EC360W | 1220×610×370 | 1100-2200 | 370Pa TSP | ISO 3-5 | EC Brushless Motor |
Example: 12-inch wafer fab photolithography zone (ISO 3)
Based on 2×4 ft FFU (1220×610mm), U16 ULPA + EC motor, rated airflow 1800m³/h
| Comparison Parameter | Yiran® FF-U16-EC | Leading Intl Brand A | Leading Intl Brand B | Yiran® Advantage |
|---|---|---|---|---|
| ULPA Efficiency (MPPS) | ≥99.99995% U16 | ≥99.9995% U15 | ≥99.99995% U16 | Eq./Superior |
| Unit Power (1800m³/h) | 260 W | 310 W | 280 W | 7-16% Savings |
| Total Static Pressure | 370 Pa | 380 Pa | 360 Pa | Meets Demand |
| Noise @1m | 52 dBA | 55 dBA | 53 dBA | 2-3dBA Lower |
| EC Motor Efficiency | 62% | 58% | 60% | +2-4% |
| AMC Capacity (CGD NH₃) | 8wt% | 6wt% | 7wt% | +14-33% |
| Annual Energy/Unit (24/7) | 2,278 kWh | 2,716 kWh | 2,453 kWh | 7-16% Savings |
* Test conditions: 23°C/45%RH. FFU power at filter initial state; energy comparison based on 24/7/365 continuous operation.
Key Results:
Key Results:
Yiran® semiconductor technical experts will contact you within 24 hours with ISO 3-7 cleanroom and AMC control customized solutions.